Consultation > Par auteur > Atounti Mohamed

Fluid Modelling of Plasma Discharge at Low Pressures
Mohamed El Haim  1, *@  , Mimoun El Hammouti  1, *@  , Mohamed Atounti  2, *@  , Hassan Chatei  3, *@  , Mohamed El Bojaddaini  3, *@  
1 : OLMAN-RL
FPN -  Maroc
2 : MASI
FPN -  Maroc
3 : LPMR
FSO -  Maroc
* : Auteur correspondant

Discharge characteristics of argon microwave plasma were investigated by using fluid simulation of a MPACVD (Microwave Plasma Assisted Chemical Vapor Deposition) reactor based on finite elements method at low pressure (25-250) Pa. The microwave power was 2.45 GHz TM mode transmitted through the resonant cavity. Microwave power and pressure were considered simulation parameters and argon was used for working gas.

A self-consistent fluid model was developed in Comsol Multiphysics Plasma Module for studying the discharge phenomena. The 2D plasma fluid model gives a complete description of spatial-and time evolution of the discharge characteristics such us: electron density and electron temperature. Simulation results show a strong effect of input parameters on the species densities distribution in the plasma.


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